Atomic layer deposition of titanium, zirconium and hafnium dioxides: growth mechanisms and properties of thin films

€5.00

Tartu : Tartu University Press, 2007 (Tartu : Tartu Ülikooli Kirjastuse trükikoda)

218, [1] p. : ill. ; 25 cm

Dissertationes physicae Universitatis Tartuensis, 1406-0647 ; 48, [p.o. 49]

ISBN : 9789949115426

Paperback, used book in good condition.

Quantity

Dissertation on the subject of atomic layer deposition.

Summary in Estonian

Aarik, Jaan
1 Item