Atomic layer deposition of titanium, zirconium and hafnium dioxides: growth mechanisms and properties of thin films
€5.00
Tax included
Tartu : Tartu University Press, 2007 (Tartu : Tartu Ülikooli Kirjastuse trükikoda)
218, [1] p. : ill. ; 25 cm
Dissertationes physicae Universitatis Tartuensis, 1406-0647 ; 48, [p.o. 49]
ISBN : 9789949115426
Paperback, used book in good condition.
Dissertation on the subject of atomic layer deposition.
Summary in Estonian
Aarik, Jaan
1 Item
Tartu : Tartu University Press, 2007 (Tartu : Tartu Ülikooli Kirjastuse trükikoda)
218, [1] p. : ill. ; 25 cm
Dissertationes physicae Universitatis Tartuensis, 1406-0647 ; 48, [p.o. 49]
ISBN : 9789949115426
Paperback, used book in good condition.